Electrolytic polishing / etching device
ELOPREP 102 – electrolytic metallography preparation
Electrolytic preparation is one of the most efficient methods in metallography – preparation because the process is unmanned once started. Besides the advantage of streamlining, it also results in completely stress-free material removal. Unlike conventional metallographic grinding and polishing, no mechanical deformation or heat is introduced – surface hardening is impossible. The principle is based on electrochemical ablation using a power source. Metal particles are anodically ablated in an electrolyte suitable for the specific metal and at a current intensity adjusted accordingly. The material sample acts as the anode within the electrochemical cell. During the process, particles are continuously removed from the sample surface, thus reducing surface roughness. This principle works because peaks are ablated faster than valleys – the surface is smoothed.
Highlights ELOPREP 102
- Automatic, programmable polishing + etching
- easily programmable SIEMENS PLC control + 7 inch color LCD touchscreen
- Scan function for easy determination of parameters
- short polishing time, excellent reproducibility
- separate polishing device with drain pipe + integrated cooling system
- 2 polishing / etching units can be controlled in parallel with one electronic unit
- Voltage polishing: 0-100V, etching 0-25V, external etching 0-25V
- variable polishing time / current intensity with current limitation
- built-in safety functions with constant electrolyte monitoring
- speed-controlled pump with magnetic stirrer for electrolyte flow
- suitable for electrolytic polishing at normal + low temperature
- ready-to-use delivery including stainless steel cathode
- Option: external etching option
Video ELOPREP 102 electrolytic polishing and etching
Technical information
|
Order number |
46 02 |
|
temperature limiter |
30 - 50 ° C |
|
Pump |
magnetic stirrer |
|
electrolyte vessel volume / external container |
1000 / 1200 ml |
|
Cooling system |
Integrated |
|
polishing at low temperatures |
Ja |
|
dimensions of the mask |
0 – 0,5 – 1 – 2 – 5 cm² |
|
scan function |
Automatic |
|
Service |
7″ HMI touchscreen |
|
program memory |
99 |
|
Output voltage / current: polishing | etching | external etching |
0-120 | 0 – 35 | 0 – 25 volts |
|
Power Supply |
110/120V | 230V |
|
Dimensions W x D x H mm Control | Polishing unit |
404x370x305 | 210x370x305 |
|
Weight kg Control unit | Polishing unit |
20 | 5 |
Accessories
Optional accessories for ELOPREP 102
46 09 | Additional polishing and etching unit Suitable for electrolytic polishing at normal and low temperatures Two polishing and etching units that can be operated by the same control unit Must be ordered at the same time as ELOPREP 102 |
46 10 | External etching unit for large parts |
46 08 | electrolyte container with lid |
46 12 | 1 set of 5 masks (apertures) 0,5 cm² |
46 13 | 1 set of 5 masks (apertures) 1cm² |
46 14 | 1 set of 5 masks (apertures) 2cm² |
46 15 | 1 set of 5 masks (apertures) 5cm² |
46 16 | 1 set of 5 masks (without apertures) |
46 17 | 1 set of masks (0,5 |1 |2 |5 cm² and one without aperture) |
YM 6904-00 | stainless steel cathode |
YM 6937-00 | copper cathode |
YM 6936-00 | titanium cathode |
